| DATE: |
2005-01-13 10:30 - 11:30 |
| PLACE: |
4-go-kan 2F Rinkoshitsu 1 |
| TITLE: |
IMSS Seminar Interface structure of photonic multilayers prepared by plasma enhanced chemical vapor deposition |
| SPEAKER: |
Dr. Hyeonjae Kim (a Visiting Research Fellow, Mitsubishi Chemical Science and Technology Research Center) |
| LANGUAGE: |
English |
| URL: |
http://pfwww.kek.jp/pf-seminar/ |
| ABSTRACT: |
The structures of substrate/layer, layer/layer, and layer/air interfaces in optical multilayers made using plasma enhanced chemical vapor deposition (PECVD) have been probed for the first time using neutron reflectivity and X-ray reflectivity. The basic principle of the reflectivity will be discussed and the benefit of using both of the reflectivities will be emphasized.
From the point of view of optical applications the interfaces are extremely sharp, sharper than is often achievable with the self-assembly of block copolymers or deposition techniques in which the polymer layers contact while in a fluid state. The average interface width, aI, between layers made from different precursors is about 40 Angstrom (16 Angstrom rms). The layer/layer interfaces are generally 2-3 times broader than the layer/air interfaces. Polymeric fluorocarbon films deposited on a Si substrate using PECVD with octafluorocyclobutane (OFCB) monomer show uniform scattering length density with depth except for a region of molecular thickness immediately adjacent to the substrate. Films made from deuterated benzene show uniform density throughout the film thickness.
Reference>
H. Kim, M. D. Foster, H. Jiang, S. Tullis, T. J. Bunning, C. F. majkrzak, Polymer 45 (2004) 3175. |
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