Photon Factory

KEK

AR-NE5C : High-pressure and High-temperature X-ray Diffraction (MAX-80)

Overview

Beamline group  Subcommittee 6 (High Pressure Science)
Techniques
  • Energy-dispersive X-ray diffraction
  • XAFS (transmission)
Features
  • In-situ measurements under high-pressure and high-temperature conditions using multi-anvil press
  • Energy-dispersive X-ray diffraction (2θ : approximately 3 - 35°)
  • Short-time switching between white and mono X-ray optics (a few minutes)
Area of research
  • High pressure science
  • Earth and planetary science
Contact
  • Yuki SHIBAZAKI yuki.shibazaki(at)kek.jp
  • Please change (at) to @ in the e-mail address.
Notes

Performance

Source
  • 6.5/5.0GeV PF-AR Bending magnet(NE5)
Optics
  • Monochromator (Fix-exit double crystal Si(111) (standard) and Si(311) (optional), Indirect water cooling)
Energy range
  • 20 - 140 keV (white X-ray)
  • 10 - 60 keV (mono X-ray)
Resolution (ΔE/E)
  • ~ 5 × 10-4
Beam size
  • 30 mm (width) × 3 mm (height)
Photon flux
  • ~ 109 photons/s/mm2
Instruments
  • 500-ton DIA-type press (MAX80)
MAX80
Detectors
  • Ge-SSD (vertical goniometer)
  • Ion chamber
Remote / Mail-in
  • Not available
Special notes

More information

References

  1. D. Wakabayashi et al., Phys. Rev. B, 96, 024105 (2017), doi:10.1103/PhysRevB.96.024105

Publications

KEK-PF Publication Database (Publications of AR-NE5C)

Last updated: 2022-11-28