Photon Factory

KEK

BL-7C : Versatile Hard X-ray Experiment

Overview

Beamline group Subcommittee 2 (Diffraction and Scattering)
Techniques
  • monochromatic X-ray for general purpose
Features
  • your own experimental equipment available
  • monochromatic X-ray
  • sagittally focusing in horizontal
  • double total reflection mirror for high-order diffraction removal
  • focusing in vertical by the mirror
  • downward X-ray beam available
  • various gases for ion chambers available
Area of research
  • X-ray diffraction structure analysis for thin film
  • secondary X-ray emission spectroscopy
  • X-ray anomalous scattering structure analysis
  • XAFS for solution surface
Contacts
  • Hiroshi SUGIYAMA hiroshi.sugiyama(at)kek.jp
  • Please change (at) to @ in the e-mail address.
Special notes

Performance

Source
  • 2.5GeV PF Bending magnet (B07)
Optics
  • sagittally focusing Si (111) double-crystal monochromator with constant exit beam height
  • double total reflection mirror
Energy range
  • 4 - 20 keV
Resolution
Beam size
  • MAX about 80 mm (H) x 8 mm (V)
  • MIN about 1 x 1 mm2 (focused)
Photon flux
  • MAX about 1 x 1012 photons/s @ 10 keV
Instruments
  • X-ray thin film diffractometer (SOR-SmartLab)
  • X-ray anomalous scattering diffractometer (AXS-1)
  • X-ray emission spectroscope (Escargot)
  • XAFS equipment
(user-managed except for XAFS related equipment)
Detectors
  • Ionization chamber (with N2, Ar, and mixed gas)
Remote / Mail-in
  • Not available
Special notes

More information

References

Pubications

KEK-PF Publication Database (Publications of BL-7C)

Last updated: 2022-2-10